NC25SC Cleaning system for semiconductor
Compatible with clean rooms, our process will answer to your highest requirement while reducing operation costs
Efficiency, Economy, Environment : 3E
- Stainless steel construction,
- Machine built on containment tray,
- Built in automatic transfert system from tank to tank,
- Patented Spray Under Immersion cleaning process,
- Unique vacuum drying process,
- 100% Closed loop operation (wash and rinse).
- Customized tools,
- Cleaning fluid concentration live monitoring,
- Automatic mixing or dosing with refill of wash solution,
- Ultrasonic cleaning,
- SPC and/or Traceability NC25Manager,
- Opened loop rinsing operation.
FACILITIES
Empty weight: 750 kg
Power supply: 400V three phases+Neutre 50/60Hz 20A
Compressed air supply: 6bars max, 250L/min
Water supply: 3 bars (top up only)
Exhaust: 170 m3/h, 100mm port on top of the machine
CLEANING TANK
Pumps: 1 centrifugal stainless steel and 1 magnetic driven
Filters: 2 filters 20 inches 5µm
RINSING TANK 1
Pump: 1 centrifugal stainless steel
Filters: Activated carbon, mixed bed resin bottles and 1µm filter
RINSING TANK 2
Pump: 1 centrifugal stainless steel
Filters: Activated carbon, mixed bed resin bottles and 1µm filter
DRYING CHAMBER
Élément chauffant: Résistance Inox 5 x 400W